Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
| Line 340: | Line 340: | ||
Measurement:Measurements of multiple stacks | Measurement:Measurements of multiple stacks | ||
Acceptance criteria: Within ±2% on each layer from an ellipsometer measurement | Acceptance criteria: Within ±2% on each layer from an ellipsometer measurement (SiO2: 112nm, Si3N4: 139nm) | ||
'''Settings''' | '''Settings''' | ||
Model layers use: | |||
*SiO2_(therm) | |||
*Si3N4 | |||
'''Result''' | '''Result''' | ||