Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 1, 2 and 3== | ==Results of acceptance test no. 1, 2 and 3== | ||
Sample material: Patterned silicon substrate | Sample material: Patterned silicon substrate | ||
Measurement: Trench depth with aspect ratio 1:10, 1:11 and 1:13 on a 10µm, 8mm and 6.4µm wide trenches respectively | Measurement: Trench depth with aspect ratio 1:10, 1:11 and 1:13 on a 10µm, 8mm and 6.4µm wide trenches respectively | ||
Acceptance criteria:Depth 100±2 µm, 91±2µm and 85±2µm. The SEM profile images of the three trenches are shown here: | Acceptance criteria:Depth 100±2 µm, 91±2µm and 85±2µm. The SEM profile images of the three trenches are shown here: | ||
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[[image:Sensofar_A1_SEM.jpg|100x100px|thumb|center|A1]] | [[image:Sensofar_A1_SEM.jpg|100x100px|thumb|center|A1]] | ||