Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 9== | ==Results of acceptance test no. 9== | ||
'''Setting''' | |||
Recipe: Narrow trench | |||
Operation mode: narrow trench | |||
*Coarse shift single sampling | |||
Objective: EPI 100X-N | |||
Z scan: | |||
*Dual - bottom up | |||
**top: 4µm | |||
**Gap: 20µm (the trench depth) | |||
**Bottom: 4µm | |||
Speed factor: 1x | |||
Threshold: 0.0% | |||
Light source | |||
Levels: 2 | |||
176 -> 30 (might need to be set a little different) | |||
Gain: default | |||