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Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions

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|Size of substrate
|Size of substrate
|4" and 6" in our standard bath
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*4" and 6" in our standard bath
*4", 2" in "Fumehood KOH"
 
|4" in our standard bath
|4" in our standard bath
|4" (or smaller with carrier)
|4" (or smaller with carrier)
|6" (when it is set up for 6") and 4" (or smaller if you have a carrier)  
|6" (when it is set up for 6") and 4" (or smaller if you have a carrier)  
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|Process volume
|Batch size
|25 wafers at a time
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*25 wafers at a time
*1-5 wafers in "Fumehood KOH"
|25 wafers at a time
|25 wafers at a time
|One wafer at a time
|One wafer at a time