Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 5== | ==Results of acceptance test no. 5== | ||
Sample: Flat sample of silicon with thick patterned oxide. | Sample: Flat sample of silicon with thick patterned oxide. | ||
Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick | Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick | ||
Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here: | Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here: | ||
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[[Media:Sensofar_A5_50xDI.pdf|Sensofar A5 result ]] | [[Media:Sensofar_A5_50xDI.pdf|Sensofar A5 result ]] | ||
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==Results of acceptance test no. 6== | ==Results of acceptance test no. 6== | ||