Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 5== | ==Results of acceptance test no. 5== | ||
Sample: Flat sample of silicon with thick patterned oxide. | |||
Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick | |||
Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here: | |||
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[[image:Sensofar_A1_SEM.jpg|100x100px|thumb|center|A1]] | |||
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