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Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions

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*Phospher doped:~20Å/min
*Phospher doped:~20Å/min
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Dependent on process parameters, but in the order of 1 Å/s. See more [[Specific Process Knowledge/Thin film deposition/Si sputter in PVD co-sputter/evaporation|here]]
Dependent on process parameters, but in the order of 1 Å/s. See more [[Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec|here.]]


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