Jump to content

Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/Etch slow: Difference between revisions

← Older editNewer edit →
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 51: Line 51:
|37.5
|37.5
|37.5
|37.5
|-
|Etch material
|Si
|Si
|-
|-
|'''Results'''
|'''Results'''
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/Etch_slow"