Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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On the basis of the pxnano2 recipe from the ASE we will try to make a similar Bosch process on the Pegasus.  
On the basis of the pxnano2 recipe from the ASE we will try to make a similar Bosch process on the Pegasus.  


{| border="2" cellspacing="1" cellpadding="3" style="text-align:center;"
{| border="1" cellspacing="1" cellpadding="1" style="text-align:center;"
!Recipe
!Recipe
!
! colspan="2" align="center"| Nanobosch1
!
! colspan="2" align="center"| Nanobosch2
!
! colspan="2" align="center"| Nanobosch3
!
! colspan="2" align="center"| Nanobosch4
!
! colspan="2" align="center"| Nanobosch5
!
!
!
!
|-
|-
! Cycle
! Etch
! Dep
! Etch
! Dep
! Etch
! Dep
! Etch
! Dep
! Etch
! Dep
!C<sub>4</sub>F<sub>8</sub> (sccm)
!C<sub>4</sub>F<sub>8</sub> (sccm)
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|-
!SF<sub>6</sub> (sccm)
!SF<sub>6</sub> (sccm)
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|-
!O<sub>2</sub> (sccm)
!O<sub>2</sub> (sccm)
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|-
! Coil power (W)
! Coil power (W)
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|-
!Platen power (W)
!Platen power (W)
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|-
! Pressure (mtorr)
! Pressure (mtorr)
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! Temperature (degs C)
! Temperature (degs C)
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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! Process time (s)
! Duration (cycles/time)
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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| colspan="2" align="center"| .
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! colspan="10" align="center"| Etch rates (nm/min)
! colspan="10" align="center"| Etch rates (nm/min)

Revision as of 10:48, 19 June 2012

Development of continuous nanoetch

Recipe nano1.0 nano1.1 nano1.2 nano1.3 nano1.21 nano1.4 nano1.41 nano1.42 nano1.43
C4F8 (sccm) 52 52 52 52 75 75 75 75 75
SF6 (sccm) 38 38 38 38 38 38 38 38 38
O2 (sccm) 0 0 0 0 0 0 0 0 0
Coil power (W) 800 (F) 600 (F) 800 (F) 600 (F) 800 (F) 800 (F) 800 (F) 800 (F) 800 (F)
Platen power (W) 50 50 50 40 50 50 75 40 30
Pressure (mtorr) 4 4 4 4 4 4 4 4 4
Temperature (degs C) 10 10 -10 -10 -10 -20 -20 -20 -20
Process time (s) 120 120 120 120 120 120 120 120 120
Etch rates (nm/min)
Averages 295 228 299 235 183 183 166 160 148
Std. Dev 36 29 37 20 9 9 9 8 6
Zep etch rate (nm/min)
172 95 94 69 67 101 65 55
Sidewall angle (degrees)
Averages 93 94 92 94 91 91 90 90 90
Std. Dev 1 1 0 1 0 0 1 0 0
CD loss (nm pr edge)
Averages -11 -13 -17 -10 -10 -10 -20 -13 -24
Std. Dev 12 10 11 14 15 15 16 15 21
Bowing (nm)
Averages 31 42 13 16 6 6 3 -3 0
Std. Dev 7 6 4 3 2 2 2 3 1
Bottom curvature
Averages -45 -45 -44 -43 -32 -32 -34 -32 -39
Std. Dev 5 7 4 9 10 10 9 8 9
Images Images Images Images Images Images Images Images Images Images

Development of switched nanoetch process

On the basis of the pxnano2 recipe from the ASE we will try to make a similar Bosch process on the Pegasus.

Recipe Nanobosch1 Nanobosch2 Nanobosch3 Nanobosch4 Nanobosch5
Cycle Etch Dep Etch Dep Etch Dep Etch Dep Etch Dep C4F8 (sccm)
SF6 (sccm)
O2 (sccm)
Coil power (W)
Platen power (W)
Pressure (mtorr)
Temperature (degs C) . . . . .
Duration (cycles/time) . . . . .
Etch rates (nm/min)
Averages . . . . . . . . .
Std. Dev . . . . . . . . .
Zep etch rate (nm/min)
Averages . . . . . . . . .
Sidewall angle (degrees)
Averages . . . . . . . . .
Std. Dev . . . . . . . . .
CD loss (nm pr edge)
Averages . . . . . . . . .
Std. Dev . . . . . . . . .
Bowing (nm)
Averages . . . . . . . . .
Std. Dev . . . . . . . . .
Bottom curvature
Averages . . . . . . . . .
Std. Dev . . . . . . . . .
Images Images Images Images Images Images Images Images Images Images
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