Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
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! | ! | ||
![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]] | |||
![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]] | ![[Specific Process Knowledge/Characterization/Profiler#Dektak_8_stylus_profiler|Dektak 8 stylus profiler]] | ||
![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ![[Specific Process Knowledge/Characterization/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
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|- valign="top" | |- valign="top" | ||
|'''General description''' | |'''General description''' | ||
|Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | |||
|Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | |Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | ||
|3D Profiler for measuring micro structures. Can do wafer mapping. | |3D Profiler for measuring micro structures. Can do wafer mapping. | ||
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|'''Substrate size''' | |'''Substrate size''' | ||
|up to 8" | |up to 8" | ||
|up to 6" | |||
|Up to more than 6" | |Up to more than 6" | ||
|6" or less | |6" or less | ||
|-valign="top" | |-valign="top" | ||
|'''Max. scan range xy''' | |'''Max. scan range xy''' | ||
|Line scan x: 50µm to 200mm | |Line scan x: 50µm to 200mm | ||
|Line scan x: 50µm to 200mm | |||
|Depending on the objective: | |Depending on the objective: | ||
*One view: 127µmX95µm to 1270µmX955µm | *One view: 127µmX95µm to 1270µmX955µm | ||
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|-valign="top" | |-valign="top" | ||
|'''Max. scan range z''' | |'''Max. scan range z''' | ||
|50Å to | |50Å to 1mm | ||
|50Å to 1mm | |||
|Depending on the objective and Z resolution: | |Depending on the objective and Z resolution: | ||
*94.4µm ->9984µm | *94.4µm ->9984µm | ||
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|'''Resolution xy''' | |'''Resolution xy''' | ||
|down to 0.067 µm | |down to 0.067 µm | ||
|down to xxx µm | |||
|Depending on the objective: | |Depending on the objective: | ||
*0.5µm -> 5µm | *0.5µm -> 5µm | ||
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|-valign="top" | |-valign="top" | ||
|'''Resolution z''' | |'''Resolution z''' | ||
|1Å, 10Å or 20Å | |||
|1Å, 10Å or 20Å | |1Å, 10Å or 20Å | ||
|Depending on measuring methode: | |Depending on measuring methode: | ||
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|- valign="top" | |- valign="top" | ||
|'''Max. scan depth [µm] (as a function of trench width W''') | |'''Max. scan depth [µm] (as a function of trench width W''') | ||
|1.2*(W[µm]-5µm) | |||
|1.2*(W[µm]-5µm) | |1.2*(W[µm]-5µm) | ||
|Depending on material and trench width: | |Depending on material and trench width: | ||
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|-valign="top" | |-valign="top" | ||
|'''Tip radius''' | |'''Tip radius''' | ||
|5 µm 45<sup>o</sup> cone | |||
|5 µm 45<sup>o</sup> cone | |5 µm 45<sup>o</sup> cone | ||
|No tip - using light | |No tip - using light | ||
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|-valign="top" | |-valign="top" | ||
|'''Stress measurement''' | |'''Stress measurement''' | ||
|Can be done | |||
|Can be done | |Can be done | ||
|No stress calculation capability | |No stress calculation capability | ||
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|-valign="top" | |-valign="top" | ||
|'''Surface roughness''' | |'''Surface roughness''' | ||
|Can be done on a line scan | |||
|Can be done on a line scan | |Can be done on a line scan | ||
|Can be done on a line or an area | |Can be done on a line or an area | ||