Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBSD of Si: Difference between revisions

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{| border="2" cellspacing="1" cellpadding="3" align="left"
{| border="2" cellspacing="1" cellpadding="3" align="left"
!Depostion time
!Depostion time
!10 min
!10 min (before 2013)
!30 min
!30 min (before 2013)
!30 min
!30 min (before 2013)
!30 min (2013-10-4)
|-
|-
|Characterization method
|Characterization method
|FilmTek
|FilmTek
|FilmTek
|FilmTek
|Ellipsometer 3 angles
|Ellipsometer 3 angles
|Ellipsometer 3 angles
|-
|-
Line 55: Line 57:
|229 nm
|229 nm
|242 nm
|242 nm
|194 nm (2013-10-4)
|-
|-
|Deposition rate
|Deposition rate
Line 60: Line 63:
|7.6 nm/min
|7.6 nm/min
|8.1 nm/min
|8.1 nm/min
|6.5 nm/min
|-
|-
|Refractive index @632nm
|Refractive index @632nm
Line 71: Line 75:
n=4.589 <br/>
n=4.589 <br/>
k=0.479
k=0.479
|
n=4.625 <br/>
k=0.653
|-
|-
|Refractive index @1000nm <br/>
|Refractive index @1000nm <br/>
Line 83: Line 90:
n=4.136 <br/>
n=4.136 <br/>
k=0.189
k=0.189
|
n=4.206 <br/>
k=0.183
|-
|Refractive index @1000nm <br/>
@1550nm using the ellipsometer
|
n=? <br/>
k=?
|
n=? <br/>
k=?
|
n=? <br/>
k=?
|
n=3.970 <br/>
k=0.062
|-
|-
|Roughness
|Roughness
Line 88: Line 113:
|10.4 nm
|10.4 nm
|1.1 nm
|1.1 nm
|0.9 nm
|-
|-
|}
|}


<br clear="all" />
<br clear="all" />

Revision as of 12:15, 4 October 2013

Test of the deposition rate and film characteristics

Recipe

Recipe 1
Platen angle 10 degrees
Platen rotation speed 20rpm
Ar(N) flow 4 sccm
Ar(dep. source) flow 8 sccm
I(N) 320mA
Power 700W
I(B) 280mA
V(B) 1100V
Vacc(B) 400V


Results

Depostion time 10 min (before 2013) 30 min (before 2013) 30 min (before 2013) 30 min (2013-10-4)
Characterization method FilmTek FilmTek Ellipsometer 3 angles Ellipsometer 3 angles
Deposition thickness 71 nm 229 nm 242 nm 194 nm (2013-10-4)
Deposition rate 7.1 nm/min 7.6 nm/min 8.1 nm/min 6.5 nm/min
Refractive index @632nm

n=4.55
k=0.826

n=4.916
k=0.547

n=4.589
k=0.479

n=4.625
k=0.653

Refractive index @1000nm

@950nm using the ellipsometer

n=?
k=?

n=4.297
k=0.0836

n=4.136
k=0.189

n=4.206
k=0.183

Refractive index @1000nm

@1550nm using the ellipsometer

n=?
k=?

n=?
k=?

n=?
k=?

n=3.970
k=0.062

Roughness 6.1 nm 10.4 nm 1.1 nm 0.9 nm


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