Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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**[[/IBSD of TiO2|Deposition of TiO2]] | **[[/IBSD of TiO2|Deposition of TiO2]] | ||
**[[/IBSD of SiO2|Deposition of SiO2]] | **[[/IBSD of SiO2|Deposition of SiO2]] | ||
**[[/IBSD of Si|Deposition of Si]] | |||
==A rough overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters== | ==A rough overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters== | ||