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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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=== CYTOP etching: Results by Fei Wang, DTU Nanotech ===
=== CYTOP etching: Results by Fei Wang, DTU Nanotech ===


{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
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| 600
| 600
| 150
| 150
| This will etch PMGI, PI, & standard resists. We've never tried it for PMMA, but it should work
| The etch rate is estimated as ~1.3um/min.
|-
|-
|}
|}
Coil Power 600[W]
Platen Power 150[W]
Platen temperature 0[oC]
Pressure 3mTorr
O2 5sccm
Ar 20sccm


<gallery caption="The results of the CYTOP" widths="250" heights="200" perrow="3">
<gallery caption="The results of the CYTOP" widths="250" heights="200" perrow="3">
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image:ASEpolymerEtching-cytop3.jpg|
image:ASEpolymerEtching-cytop3.jpg|
</gallery>
</gallery>
The etch rate is estimated as ~1.3um/min.