Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions
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=== CYTOP etching: Results by Fei Wang, DTU Nanotech === | === CYTOP etching: Results by Fei Wang, DTU Nanotech === | ||
{| border="2" cellpadding="2" cellspacing="1" | |||
|+ '''Recipe''' | |||
|- | |||
! rowspan="2" align="center"| Name | |||
! colspan="2" align="center"| Materials | |||
! colspan="8" align="center"| Process parameters | |||
! rowspan="2" align="center" width="300" | | |||
|- | |||
| Mask | |||
| Etched | |||
| O<sub>2</sub> | |||
| CO<sub>2</sub> | |||
| SF<sub>6</sub> | |||
| He/Ar | |||
| Pressure | |||
| Temp | |||
| Coil | |||
| Platen | |||
|- | |||
! | |||
| | |||
| CYTOP | |||
| 5 | |||
| 0 | |||
| 0 | |||
| 20 | |||
| 3 | |||
| 0 | |||
| 600 | |||
| 150 | |||
| This will etch PMGI, PI, & standard resists. We've never tried it for PMMA, but it should work | |||
|- | |||
|} | |||
Coil Power 600[W] | Coil Power 600[W] | ||