Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
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|Possible masking materials: | |Possible masking materials: | ||
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*Silicon Oxide | |||
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*Photoresist | *Photoresist | ||
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|Possible masking materials: | |Possible masking materials: | ||
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*Silicon Oxide | |||
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*Photoresist | *Photoresist | ||