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Specific Process Knowledge/Characterization/Element analysis: Difference between revisions

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During a XPS (X-ray Photoelectron Spectroscopy) analysis, the sample is irradiated with photons of a specific energy (in the Danchip system 1486 eV). When energy of the irradiating X-rays is adsorbed by the atoms in the sample, photoelectrons are edjected [[http://en.wikipedia.org/wiki/Photoelectric_effect]].  
During a XPS (X-ray Photoelectron Spectroscopy) analysis, the sample is irradiated with photons of a specific energy (in the Danchip system 1486 eV). When energy of the irradiating X-rays is adsorbed by the atoms in the sample, photoelectrons are edjected [[http://en.wikipedia.org/wiki/Photoelectric_effect]].  


Since the energy of the incomming photons is known, and the energy of the edjected electrons is measured, the binding energy of the electrons in the probed atoms can be known. The binding energy of the electrons are element specific, and is therefore a "finger-print" of the atom.  
Since the energy of the incomming photons is known, and the energy of the edjected electrons is measured, the binding energy of the electrons in the probed atoms can be known. The binding energy of the electrons are element specific, and is therefor a "finger-print" of the atom. Hence, a measurment of the XPS spectrum gives information of which materials are present in the sample, and at which concentrations.  
 
A measurment of the XPS spectrum gives therefore information of which materials, and at which concentrations, are present in the sample.