Specific Process Knowledge/Characterization/XPS: Difference between revisions
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===Depth profiling=== | ===Depth profiling=== | ||
[[Image:Stochiometry 20110510.JPG|425x425px|left|thumb| | [[Image:Stochiometry 20110510.JPG|425x425px|left|thumb|The composition of a NiCr as a function of film depth (etch time). The relationship between Cr and Ni is quite constant through the 70nm thick film. Measurements done with XPS-ThermoScientific. ]] | ||
The analysis is made on a chosen spot on the sample surface (detected with the system camera). The technique, is as written above, very surface sensitive and probes only the top nanometers of the sample. | The analysis is made on a chosen spot on the sample surface (detected with the system camera). The technique, is as written above, very surface sensitive and probes only the top nanometers of the sample. | ||