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Specific Process Knowledge/Characterization/XPS: Difference between revisions

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[[image:Si spectra Labadvisor.JPG|300x300px|right|thumb|XPS Si2p spectrum of Si sample]]
[[image:Si spectra Labadvisor.JPG|300x300px|right|thumb|XPS Si2p spectrum of Si sample]]


== Headline text ==


[[Image:Stochiometry 20110510.JPG|300x300px|right|thumb|Stochiometry as a function of film depth (etch time). The relationship between Cr and Ni is quite stabel through the film. Measurements done with XPS-ThermoScientific ]]


==A rough overview of XPS-ThermoScientific characteristics==
==A rough overview of XPS-ThermoScientific characteristics==
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