Specific Process Knowledge/Characterization/XPS: Difference between revisions
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XPS-ThermoScientific | ===A rough overview of XPS-ThermoScientific characteristics=== | ||
{| border="2" cellspacing="0" cellpadding="20" |- | |||
!style="background:silver; color:black;" align="left"|Purpose | |||
|style="background:LightGrey; color:black"|Chemical analysis | |||
|style="background:WhiteSmoke; color:black"| | |||
* Probing elemental composition | |||
* Chemical state identification | |||
* Non destructive technique | |||
* Surface sensitive | |||
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!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Spot size | |||
|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Probing depth | |||
|style="background:WhiteSmoke; color:black"|Depending on probed element. Max probe depth lies within 10-200 Å. | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Resolution | |||
|style="background:WhiteSmoke; color:black"| | |||
µm | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Charge compensation | |||
|style="background:WhiteSmoke; color:black"| | |||
1Å, ) | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|. | |||
|style="background:WhiteSmoke; color:black"| | |||
µm | |||
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!style="background:silver; color:black" align="left"|Depth profiling | |||
|style="background:LightGrey; color:black"|uu | |||
|style="background:WhiteSmoke; color:black"| | |||
*5 | |||
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!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Substrate size | |||
|style="background:WhiteSmoke; color:black"| | |||
*up | |||
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|style="background:silver; color:black"| | |||
| style="background:LightGrey; color:black"|Substrate thickness | |||
|style="background:WhiteSmoke; color:black"| | |||
*hh | |||
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Revision as of 13:45, 17 October 2011
XPS
See more about elemental analysis on the side Element analysis
A rough overview of XPS-ThermoScientific characteristics
Purpose | Chemical analysis |
|
---|---|---|
Performance | Spot size | Can be set between 30µm - 400µm |
Probing depth | Depending on probed element. Max probe depth lies within 10-200 Å. | |
Resolution |
µm | |
Charge compensation |
1Å, ) | |
. |
µm | |
Depth profiling | uu |
|
Substrates | Substrate size |
|
Substrate thickness |
|