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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Bureaucrats, danchip, Administrators
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Bureaucrats, danchip, Administrators
1,918 edits
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| Photo resist
| Photo resist
| 12-13 % on 6" wafer
| 12-13 % on 6" wafer
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! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processB|Process B]]
! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processB|Process B]]
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