Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride: Difference between revisions

Revision as of 17:55, 13 October 2026 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,692 edits Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tungsten_Nitride&action=submit click here]''' =Vanadium Nitride (WN<sub>x</sub>)= Tungsten nitride (WNₓ, commonly W₂N or δ‑WN) is a refractory ceramic that combines very high melting temperature, extreme hardness, chemical inertness, a..."		Revision as of 17:55, 13 October 2026 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,692 edits →Deposition of Tungsten Nitride Newer edit →
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	* [[Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride/VN Reactive Sputtering in Cluster Lesker PC1\|Deposition of Vanadium Nitride (VN<sub>x></sub>) using reactive pulsed DC sputtering]] in Sputter-System Metal-Oxide(PC1) Source 5 (3-inch target)		* [[Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Nitride/VN Reactive Sputtering in Cluster Lesker PC1\|Deposition of Vanadium Nitride (VN<sub>x</sub>) using reactive pulsed DC sputtering]] in Sputter-System Metal-Oxide(PC1) Source 5 (3-inch target)