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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Bureaucrats, danchip, Administrators
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Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
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! colspan="4" | Conditions during original runs
! colspan="4" | Conditions during original runs
! Best usage
! Best usage
|-
| Bosch
| width="120" | Fast etch 
! width="120" | Feature
! width="120" | Mask material
! width="120" | Etch load
! width="120" | sice
| Cleavage lines
|-
|-
! Process A
! Process A
Line 68: Line 76:
| Cleavage lines
| Cleavage lines
|-
|-
|}
|}


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