Specific Process Knowledge/Lithography/Coaters/labspin05

Spin Coater: LabSpin 05

Spin coater: LabSpin 04 is located in PolyFabLab in building 347

Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026.

The user manual, user APV, and contact information can be found in LabManager - requires login

Training video (same tool in Cleanroom 346): LabSpin02 + 03

Process information

Useful information about resist dispense can be found here.

Equipment performance and process related parameters

Purpose		Spin coating of epoxy based resists SU-8 series SU-8 3000 series SU-8 XFT series mr-DWL series Spin coating of other resists
Resist		manual dispense
Performance	Coating thickness	SU-8 resists: 0.1-200 µm Coating thickness range is dependent on specific resist formulation
Process parameters	Spin speed	100 - 8000 rpm
	Spin acceleration	200 - 4000 rpm/s (wrongly labelled 1/s^2 in the software)
Substrates	Substrate size	chips, 5mm and up 100 mm wafers 150 mm wafers
	Allowed materials	All PolyFabLab materials See Cross Contamination Sheet in LabManager
	Batch	1