Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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===Dry Oxidation on <100> and <111> wafer=== | ===Dry Oxidation on <100> and <111> wafer=== | ||
<gallery caption=" | <gallery caption="Dry oxidation" widths="400px" heights="300px" perrow="2"> | ||
image:Oxide_thickness_vs_time_Dry_oxygen_100.JPG|Dry oxide on <100> wafer | image:Oxide_thickness_vs_time_Dry_oxygen_100.JPG|Dry oxide on <100> wafer | ||
image:Oxide_thickness_vs_time_Dry_oxygen_111.JPG|Dry oxide on <111> wafer | image:Oxide_thickness_vs_time_Dry_oxygen_111.JPG|Dry oxide on <111> wafer | ||
</gallery> | </gallery> | ||