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Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions

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===Furnace <100>-Si Dry Oxidation===
===Dry Oxidation on <100> and <111> wafer===


<gallery caption="SPlifff" widths="300px" heights="300px" perrow="2">
<gallery caption="SPlifff" widths="300px" heights="300px" perrow="2">
image:Oxide_thickness_vs_time_Dry_oxygen_100.JPG|Dry oxide
image:Oxide_thickness_vs_time_Dry_oxygen_100.JPG|Dry oxide on <100> wafer
image:Oxide_thickness_vs_time_Dry_oxygen_111.JPG|xbvgasdgas
image:Oxide_thickness_vs_time_Dry_oxygen_111.JPG|Dry oxide on <111> wafer
</gallery>
</gallery>


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