Specific Process Knowledge/Back-end processing/PDMS Microfluidic: Difference between revisions
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'''PDMS/PDMS and PDMS/glass bonding''' | '''PDMS/PDMS and PDMS/glass bonding''' | ||
The oxygen plasma treatment must be optimized for the specific surfaces to be bonded [https://doi.org/10.1109/JMEMS.2005.844746 (Bhattacharya et al., 2005)]. If the exposure is too short, not enough Si-OH sites might be created for good bonding. If the exposure is too long, too many Si-OH and roughness might result in a non-sticking silica layer. The standard conditions for bonding PDMS and glass in the system at the PDMS lab have been found to be: | |||
*Pressure: 0.35 mTorr | |||
*Oxygen flow: 100% (5-6sccm) | |||
*Power: 100% | |||
*Time: 30 s | |||
[[File:Contact Angle Plasma Tretament vs Time.jpg|1000px|thumb|center|Pictures of contact angle for water drop on PDMS and borosilicate glass after plasma treatment in the PDMS lab at DTU for different time]] | [[File:Contact Angle Plasma Tretament vs Time.jpg|1000px|thumb|center|Pictures of contact angle for water drop on PDMS and borosilicate glass after plasma treatment in the PDMS lab at DTU for different time]] | ||
[[File:Press for bonding PDMS microfluidics.jpg|thumb|Press used to improve the bonding of PDMS and glass in a microfluidic device]] | [[File:Press for bonding PDMS microfluidics.jpg|thumb|Press used to improve the bonding of PDMS and glass in a microfluidic device]] | ||