Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

Jml (talk | contribs)
Jml (talk | contribs)
Line 9: Line 9:
# The backsides of the wafers must be absolutely clean: Wipe with IPA or blow dry the backside of every wafer.
# The backsides of the wafers must be absolutely clean: Wipe with IPA or blow dry the backside of every wafer.
# Loading bonded wafers using the load must be done with utmost care avoiding to change the position of the carousel.
# Loading bonded wafers using the load must be done with utmost care avoiding to change the position of the carousel.
Please contact Roy, Peter or Jonas to make a training session.
</div>
</div>