Specific Process Knowledge/Lithography: Difference between revisions
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'''[[Specific Process Knowledge/Lithography/Coaters|Automatic spin coating]]''' | '''[[Specific Process Knowledge/Lithography/Coaters|Automatic spin coating]]''' | ||
*[[Specific_Process_Knowledge/Lithography/Coaters | *[[Specific_Process_Knowledge/Lithography/Coaters/GammaUV|Spin Coater: Gamma UV]] | ||
*[[Specific Process Knowledge/Lithography/ | *[[Specific Process Knowledge/Lithography/Coaters/GammaDUV|Spin Coater: Süss Stepper]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters | *[[Specific_Process_Knowledge/Lithography/Coaters/GammaEbeam|Spin Coater: Gamma e-beam & UV]] | ||
'''[[Specific Process Knowledge/Lithography/Coaters|Manual spin coating]]''' | '''[[Specific Process Knowledge/Lithography/Coaters|Manual spin coating]]''' | ||
*[[Specific Process Knowledge/Lithography/Coaters | *[[Specific Process Knowledge/Lithography/Coaters/RCD8|Spin Coater: RCD8]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters | *[[Specific_Process_Knowledge/Lithography/Coaters/labspin|Spin Coater: Labspin 02/03]] | ||
*[[Specific_Process_Knowledge/Lithography/Coaters/labspin04|Spin Coater: Labspin 04 (PFL)]] | |||
'''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]''' | '''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]''' | ||
*[[Specific_Process_Knowledge/Lithography/Coaters | *[[Specific_Process_Knowledge/Lithography/Coaters/sprayCoater|Spray Coater]] | ||
'''[[Specific Process Knowledge/Lithography/Baking|Soft & hard baking]]''' | '''[[Specific Process Knowledge/Lithography/Baking|Soft & hard baking]]''' | ||
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*[[Specific Process Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]] | *[[Specific Process Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]] | ||
*[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]] | *[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]] | ||
*[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]] | *[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04 (PFL)]] | ||
*[[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|Mask Aligner vs Maskless Aligner]] | *[[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|Mask Aligner vs Maskless Aligner]] | ||