Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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==AZ nLOF 2020== | ==AZ nLOF 2020== | ||
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===Resolution (AZ nLOF 2020)=== | ===Resolution (AZ nLOF 2020)=== | ||
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'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:''' | '''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:''' | ||
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===Resist profile (AZ nLOF 2020)=== | ===Resist profile (AZ nLOF 2020)=== | ||
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====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)==== | ====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)==== | ||
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'''Result of image analysis of SEM images of 2µm triplets:''' | '''Result of image analysis of SEM images of 2µm triplets:''' | ||
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====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)==== | ====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)==== | ||
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'''Result of image analysis of SEM images of 2µm triplets:''' | '''Result of image analysis of SEM images of 2µm triplets:''' | ||