Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions
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*[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]] | *[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]] | ||
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]] | ||
{| border="2" cellspacing="1" cellpadding="3" style="text-align:center;" | |||
!Recipe | |||
!nano1.0 | |||
!nano1.1 | |||
!nano1.2 | |||
!nano1.3 | |||
!nano1.21 | |||
!nano1.4 | |||
!nano1.41 | |||
!nano1.42 | |||
!nano1.43 | |||
|- | |||
!C<sub>4</sub>F<sub>8</sub> (sccm) | |||
|52 | |||
|52 | |||
|52 | |||
|52 | |||
|75 | |||
|75 | |||
|75 | |||
|75 | |||
|75 | |||
|- | |||
!SF<sub>6</sub> (sccm) | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|38 | |||
|- | |||
!O<sub>2</sub> (sccm) | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|0 | |||
|- | |||
! Coil power (W) | |||
|800 (F) | |||
|600 (F) | |||
|800 (F) | |||
|600 (F) | |||
|800 (F) | |||
|800 (F) | |||
|800 (F) | |||
|800 (F) | |||
|800 (F) | |||
|- | |||
!Platen power (W) | |||
|50 | |||
|50 | |||
|50 | |||
|40 | |||
|50 | |||
|50 | |||
|75 | |||
|40 | |||
|30 | |||
|- | |||
! Pressure (mtorr) | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|4 | |||
|- | |||
! Temperature (degs C) | |||
| 10 | |||
| 10 | |||
| -10 | |||
| -10 | |||
| -10 | |||
| -20 | |||
| -20 | |||
| -20 | |||
| -20 | |||
|- | |||
! Process time (s) | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|120 | |||
|- | |||
! colspan="10" align="center"| Etch rates (nm/min) | |||
|- | |||
| Averages||.||.||.||.||.||.||.||.||. | |||
|- | |||
| Std. Dev||.||.||.||.||.||.||.||.||. | |||
|- | |||
! colspan="10" align="center"| Zep etch rate (nm/min) | |||
|- | |||
| || ||.||.||.||.||.||.||.||.||. | |||
|- | |||
! colspan="10" align="center"| Sidewall angle (degrees) | |||
|- | |||
| Averages||.||.||.||.||.||.||.||.||. | |||
|- | |||
| Std. Dev||.||.||.||.||.||.||.||.||. | |||
|- | |||
! colspan="10" align="center"| CD loss (nm pr edge) | |||
|- | |||
| Averages||.||.||.||.||.||.||.||||. | |||
|- | |||
| Std. Dev||.||.||.||.||.||.||.||.|| | |||
|- | |||
! colspan="10" align="center"| Bowing (nm) | |||
|- | |||
| Averages||.||.||.||.||.||.||.||.|| | |||
|- | |||
| Std. Dev||.||.||.||.||.||.||||.||. | |||
|- | |||
! colspan="10" align="center"| Bottom curvature | |||
|- | |||
| Averages||.||.||.||.||.||.||.||.||. | |||
|- | |||
| Std. Dev||.||.||.||.||.||.||.||.||. | |||
|- | |||
! Images | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano121|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano141|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Images]] | |||
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano143|Images]] | |||
|- | |||
|} |
Revision as of 13:45, 18 June 2012
Recipe | nano1.0 | nano1.1 | nano1.2 | nano1.3 | nano1.21 | nano1.4 | nano1.41 | nano1.42 | nano1.43 |
---|---|---|---|---|---|---|---|---|---|
C4F8 (sccm) | 52 | 52 | 52 | 52 | 75 | 75 | 75 | 75 | 75 |
SF6 (sccm) | 38 | 38 | 38 | 38 | 38 | 38 | 38 | 38 | 38 |
O2 (sccm) | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 |
Coil power (W) | 800 (F) | 600 (F) | 800 (F) | 600 (F) | 800 (F) | 800 (F) | 800 (F) | 800 (F) | 800 (F) |
Platen power (W) | 50 | 50 | 50 | 40 | 50 | 50 | 75 | 40 | 30 |
Pressure (mtorr) | 4 | 4 | 4 | 4 | 4 | 4 | 4 | 4 | 4 |
Temperature (degs C) | 10 | 10 | -10 | -10 | -10 | -20 | -20 | -20 | -20 |
Process time (s) | 120 | 120 | 120 | 120 | 120 | 120 | 120 | 120 | 120 |
Etch rates (nm/min) | |||||||||
Averages | 295 | 228 | 299 | 235 | 183 | 183 | 166 | 160 | 148 |
Std. Dev | 36 | 29 | 37 | 20 | 9 | 9 | 9 | 8 | 6 |
Zep etch rate (nm/min) | |||||||||
172 | 95 | 94 | 69 | 67 | 101 | 65 | 55 | ||
Sidewall angle (degrees) | |||||||||
Averages | 93 | 94 | 92 | 94 | 91 | 91 | 90 | 90 | 90 |
Std. Dev | 1 | 1 | 0 | 1 | 0 | 0 | 1 | 0 | 0 |
CD loss (nm pr edge) | |||||||||
Averages | -11 | -13 | -17 | -10 | -10 | -10 | -20 | -13 | -24 |
Std. Dev | 12 | 10 | 11 | 14 | 15 | 15 | 16 | 15 | 21 |
Bowing (nm) | |||||||||
Averages | 31 | 42 | 13 | 16 | 6 | 6 | 3 | -3 | 0 |
Std. Dev | 7 | 6 | 4 | 3 | 2 | 2 | 2 | 3 | 1 |
Bottom curvature | |||||||||
Averages | -45 | -45 | -44 | -43 | -32 | -32 | -34 | -32 | -39 |
Std. Dev | 5 | 7 | 4 | 9 | 10 | 10 | 9 | 8 | 9 |
Images | Images | Images | Images | Images | Images | Images | Images | Images | Images |
Recipe | nano1.0 | nano1.1 | nano1.2 | nano1.3 | nano1.21 | nano1.4 | nano1.41 | nano1.42 | nano1.43 | |
---|---|---|---|---|---|---|---|---|---|---|
C4F8 (sccm) | 52 | 52 | 52 | 52 | 75 | 75 | 75 | 75 | 75 | |
SF6 (sccm) | 38 | 38 | 38 | 38 | 38 | 38 | 38 | 38 | 38 | |
O2 (sccm) | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | |
Coil power (W) | 800 (F) | 600 (F) | 800 (F) | 600 (F) | 800 (F) | 800 (F) | 800 (F) | 800 (F) | 800 (F) | |
Platen power (W) | 50 | 50 | 50 | 40 | 50 | 50 | 75 | 40 | 30 | |
Pressure (mtorr) | 4 | 4 | 4 | 4 | 4 | 4 | 4 | 4 | 4 | |
Temperature (degs C) | 10 | 10 | -10 | -10 | -10 | -20 | -20 | -20 | -20 | |
Process time (s) | 120 | 120 | 120 | 120 | 120 | 120 | 120 | 120 | 120 | |
Etch rates (nm/min) | ||||||||||
Averages | . | . | . | . | . | . | . | . | . | |
Std. Dev | . | . | . | . | . | . | . | . | . | |
Zep etch rate (nm/min) | ||||||||||
. | . | . | . | . | . | . | . | . | ||
Sidewall angle (degrees) | ||||||||||
Averages | . | . | . | . | . | . | . | . | . | |
Std. Dev | . | . | . | . | . | . | . | . | . | |
CD loss (nm pr edge) | ||||||||||
Averages | . | . | . | . | . | . | . | . | ||
Std. Dev | . | . | . | . | . | . | . | . | ||
Bowing (nm) | ||||||||||
Averages | . | . | . | . | . | . | . | . | ||
Std. Dev | . | . | . | . | . | . | . | . | ||
Bottom curvature | ||||||||||
Averages | . | . | . | . | . | . | . | . | . | |
Std. Dev | . | . | . | . | . | . | . | . | . | |
Images | Images | Images | Images | Images | Images | Images | Images | Images | Images |