Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
{{cc-nanolab}} | {{cc-nanolab}} | ||
'''Feedback to this page''': '''[mailto: | '''Feedback to this page''': '''[mailto:taran@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]''' | ||
[[Category:Equipment|Lithography exposure]] | [[Category:Equipment|Lithography exposure]] | ||
| Line 10: | Line 10: | ||
=Mask Aligner vs Maskless Aligner= | =Mask Aligner vs Maskless Aligner= | ||
Slides presented at NNUM in Uppsala | In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden. | ||
Slides presented at NNUM in Uppsala: [[Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']] | |||
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]] | Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]] | ||
=Data from the investigation= | =Data from the investigation= | ||
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]] | <!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]] | ||
--> | |||
==AZ 5214E== | |||
===Resolution (AZ 5214E)=== | ===Resolution (AZ 5214E)=== | ||
<br clear="all" /> | <br clear="all" /> | ||