Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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====Linewidth and sidewall angle vs exposure dose (AZ MiR 701)==== | ====Linewidth and sidewall angle vs exposure dose (AZ MiR 701)==== | ||
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'''Result of image analysis of SEM images of 2µm triplets:''' | |||
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|[[Image:MiR_Linewidth vs dose.jpg|500px]] | |||
|[[Image:MiR_Sidewall vs dose.jpg|500px]] | |||
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| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). | |||
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'''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:''' | '''SEM images of 1.5µm AZ MiR 701 as a function of exposure dose for Aligner: MA6-2 using vacuum contact:''' | ||
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|[[Image:W15 MLA2 MiR F2 D375_01.jpg|280px]] | |[[Image:W15 MLA2 MiR F2 D375_01.jpg|280px]] | ||
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