Specific Process Knowledge/Thin film deposition/Deposition of Platinum: Difference between revisions
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|10Å to | |10Å to 5000Å | ||
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| Deposition rate | | Deposition rate | ||
Revision as of 10:05, 19 September 2011
Platinum can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.
| E-beam evaporation (Alcatel) | E-beam evaporation (Wordentec) | |
|---|---|---|
| Batch size |
|
|
| Pre-clean | RF Ar clean | RF Ar clean |
| Layer thickness | 10Å to 5000Å | 10Å to 5000Å |
| Deposition rate | 2Å/s to 15Å/s | 10Å/s to 15Å/s |