Specific Process Knowledge/Lithography/EBeamLithography/Nanobook: Difference between revisions
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== Etching == | == Etching == | ||
The pattern was etched in an SF6 plasma using an SPTS Pegasus system. The etched depth is about 30 nm. | The pattern was etched in an SF6 plasma using an SPTS Pegasus system. The etched depth is about 30 nm. | ||
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The resulting pattern after etching and resist stripping. | |||
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== Imaging == | == Imaging == | ||
SEM imaging was done on both a Zeiss Gemini and a Raith eLine Plus system. The latter is a fully automated system that was used to acquire 295 images to fully image the entire book. | SEM imaging was done on both a Zeiss Gemini and a Raith eLine Plus system. The latter is a fully automated system that was used to acquire 295 images to fully image the entire book. | ||