Specific Process Knowledge/Lithography/EBeamLithography/Nanobook: Difference between revisions
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The exposure was done on our state of the art JEOL 9500 FSZ exposure system. If you are interested in seeing the system in operation consider this video on our Youtube channel. Exposure was done at a low beam current of only 0.22 nA and a voltage of 100 keV. The DTU logo on the chip was however exposed at a much higher beam current. | The exposure was done on our state of the art JEOL 9500 FSZ exposure system. If you are interested in seeing the system in operation consider this video on our Youtube channel. Exposure was done at a low beam current of only 0.22 nA and a voltage of 100 keV. The DTU logo on the chip was however exposed at a much higher beam current. | ||
[[File:TPE02803.jpg|right|400px]] | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
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Our JEOL 9500 FSZ system in the DTU Nanolab cleanroom. | |||
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== Etching == | == Etching == | ||