Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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'''SEM images from different exposure equipment:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!2µm triplets | |||
!Lines | |||
!Trenches | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-2 | |||
100mJ/cm<sup>2</sup>, vacuum contact | |||
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|400px]] | |||
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|400px]] | |||
|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg|400px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-1 | |||
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed) | |||
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg|400px]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: Maskless 02 (MLA2) | |||
90mJ/cm<sup>2</sup>, defoc 2 | |||
|[[Image:W13 mla2 5214E D90 F2_05.jpg|400px]] | |||
|[[Image:W13 mla2 5214E D90 F2_01.jpg|400px]] | |||
|[[Image:W13 mla2 5214E D90 F2_02.jpg|400px]] | |||
|} | |||
<br clear="all" /> | |||
'''SEM images of different size structures:''' | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
! | |||
!1µm triplets | |||
!2µm triplets | |||
!4µm triplets | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Aligner: MA6-1 | |||
100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed) | |||
|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg|400px]] | |||
|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg|400px]] | |||
|} | |} | ||
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