Jump to content

Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,797 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,797 edits
Line 192: Line 192:
====Linewidth and sidewall angle vs exposure dose====
====Linewidth and sidewall angle vs exposure dose====


'''SEM images of 2µm triplets as a function of exposure dose:'''
'''SEM images as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 208: Line 208:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
|2µm triplets
Vacuum contact
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
Line 215: Line 214:
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W14 MA62 5214E vac D85_H6B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_02.jpg|280px]]


|}
|}
<br clear="all" />
<br clear="all" />


'''SEM images as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 233: Line 242:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| rowspan="2" |Aligner: Maskless 02 (MLA2)
|2µm triplets
Defoc 2
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
Line 242: Line 250:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Trenches and Lines
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA"