Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
| Line 77: | Line 77: | ||
|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*C<sub>4</sub>F<sub>8</sub>: 0- | *C<sub>4</sub>F<sub>8</sub>: 0-100 sccm | ||
*O<sub>2</sub>: 0-100 sccm | *O<sub>2</sub>: 0-100 sccm | ||
*CF<sub>4</sub>: 0- | *CF<sub>4</sub>: 0-43 sccm | ||
*H<sub>2</sub>: 0-30 sccm | *H<sub>2</sub>: 0-30 sccm | ||
*He: 0-500 sccm | *He: 0-500 sccm | ||