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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,707 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,707 edits
Line 355: Line 355:
|+
|+
!Exposure equipment
!Exposure equipment
!Dose
!Dose [mJ/cm<sup>2</sup>]
!Contact/Defoc
!Contact/Defoc
!Resolution
!Resolution [µm]
!Comment
!Comment
|-
|-
Line 363: Line 363:
|154
|154
|Vacuum
|Vacuum
|1µm
|1
|
|
|-
|-
Line 369: Line 369:
|220
|220
| -4
| -4
|2µm
|2
|
|
|-
|-
Line 375: Line 375:
|450
|450
|0
|0
|1.25µm
|1.25
|
|
|}
|}
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