Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]''' | ||
[[Category: Equipment|Lithography exposure]] | [[index.php?title=Category:Equipment|Lithography exposure]] | ||
[[Category: Lithography|Exposure]] | [[index.php?title=Category:Lithography|Exposure]] | ||
__TOC__ | __TOC__ | ||
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=Mask Aligner vs Maskless Aligner= | =Mask Aligner vs Maskless Aligner= | ||
Slides presented at NNUM in Uppsala 2026: [[ | Slides presented at NNUM in Uppsala 2026: [[index.php?title=Media:MA6 vs MLA 2026 v09.pdf|'''MA6 vs MLA 2026_v09''']] | ||
Mask design used in the investigation: [[ | Mask design used in the investigation: [[index.php?title=Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]] | ||
=Additional data= | =Additional data= | ||
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* Table with optimal parameters and resolution for different aligners | * Table with optimal parameters and resolution for different aligners | ||
* SEM pictures | * SEM pictures | ||
{| class="wikitable" | |||
|+ | |||
!Exposure equipment | |||
!Dose | |||
!Contact/Defoc | |||
!Resolution | |||
!Comment | |||
|- | |||
|Aligner: MA6-2 | |||
|100 | |||
|Vacuum | |||
|1µm | |||
| | |||
|- | |||
|Aligner: MA6-1 | |||
|100 | |||
|Vacuum | |||
|1.25µm | |||
|Probably over-exposed | |||
|- | |||
|Aligner: Maskless 02 (MLA2) | |||
|90 | |||
|2 | |||
|1.25µm | |||
| | |||
|} | |||
<br clear="all" /> | <br clear="all" /> | ||