Specific Process Knowledge/Lithography/nLOF: Difference between revisions
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*PEB time: 60 s | *PEB time: 60 s | ||
The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. | The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. However, for less heat conductive substrates, such as glass, we recommend increasing the PEB time to 120s. | ||
===PEB baking time investigation=== | ===PEB baking time investigation=== | ||