Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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*Reactive Ion beam etch using F (or Cl) | *Reactive Ion beam etch using F (or Cl) | ||
*Sputter deposition of for example high quality optical layers | *Sputter deposition of for example high quality optical layers | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Performance | !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Performance | ||