Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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#Clean substrate and chamber with DI water | #Clean substrate and chamber with DI water | ||
#Dry substrate and chamber with nitrogen | #Dry substrate and chamber with nitrogen | ||
Multipuddle recipes repeat steps 2-4 for the given number of puddles. | Multipuddle recipes repeat steps 2-4 for the given number of puddles. | ||