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Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions

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#Clean substrate and chamber with DI water
#Clean substrate and chamber with DI water
#Dry substrate and chamber with nitrogen
#Dry substrate and chamber with nitrogen


Multipuddle recipes repeat steps 2-4 for the given number of puddles.
Multipuddle recipes repeat steps 2-4 for the given number of puddles.