Specific Process Knowledge/Lithography/Strip/resistStrip: Difference between revisions
Created page with "=Resist Strip= 400px|thumb|Resist strip bench in D-3 This resist strip is only for wafers without metal and SU-8. There are one Remover 1165 bath for stripping and one IPA bath for rinsing. '''Here are the main rules for resist strip use:''' *Place the wafers in a wafer holder and put them in the first bath for 10 min, this time is depending how much resist you have on the surface. *After the strip rinse your wafers in the IPA bath for 2-3..." |
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=Resist Strip= | =Resist Strip= | ||
[[Image:Resist_strip.jpg|400px|thumb|Resist strip bench in D-3]] | [[Image:Resist_strip.jpg|400px|thumb|Resist strip bench in D-3]] | ||
Revision as of 14:19, 16 January 2026
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Resist Strip
This resist strip is only for wafers without metal and SU-8.
There are one Remover 1165 bath for stripping and one IPA bath for rinsing.
Here are the main rules for resist strip use:
- Place the wafers in a wafer holder and put them in the first bath for 10 min, this time is depending how much resist you have on the surface.
- After the strip rinse your wafers in the IPA bath for 2-3 min.
- Rinse your wafers for 4-5 min. in running water after stripping.
The user manual and contact information can be found in LabManager: Resist Strip - requires login