Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMasklessAligners: Difference between revisions
Created page with "The exposure doses listed below are for ''generic'' good exposure results, and can be a compromise between getting good lines, as well as good dots, in both clear field and dark field exposures. The optimal dose and achievable resolution for any given specific project, could be different from the listed values. All doses are for standard silicon wafers, unless otherwise stated. Development is done using 2.38% TMAH (AZ 726 MIF). ===Aligner: Maskless 01=== The Aligner:..." |
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=Exposure dose for maskless aligners= | |||
The exposure doses listed below are for ''generic'' good exposure results, and can be a compromise between getting good lines, as well as good dots, in both clear field and dark field exposures. The optimal dose and achievable resolution for any given specific project, could be different from the listed values. | The exposure doses listed below are for ''generic'' good exposure results, and can be a compromise between getting good lines, as well as good dots, in both clear field and dark field exposures. The optimal dose and achievable resolution for any given specific project, could be different from the listed values. | ||
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==Aligner: Maskless 01== | |||
The Aligner: Maskless 01 has a 365 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the pneumatic autofocus system. | The Aligner: Maskless 01 has a 365 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the pneumatic autofocus system. | ||
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==Aligner: Maskless 02== | |||
The Aligner: Maskless 02 has a 375 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the optical autofocus system, unless otherwise specified. | The Aligner: Maskless 02 has a 375 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the optical autofocus system, unless otherwise specified. | ||
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==Aligner: Maskless 03== | |||
The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the pneumatic autofocus system. | The Aligner: Maskless 03 has a 405 nm laser light source with a FWHM of ~1 nm. The test exposures on this tool were made using the pneumatic autofocus system. | ||