Specific Process Knowledge/Lithography/UVExposure/aligner MA6-1: Difference between revisions
Created page with "==Aligner: MA6-1== 400px|thumb|The Aligner: MA6-1 is located in PolyFabLab. SUSS Mask Aligner MA6 is designed for high resolution photolithography. The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, hard, soft, proximity) are supplied. Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alig..." |
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===Exposure dose=== | ===Exposure dose=== | ||
[[Specific Process Knowledge/Lithography/Resist | [[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners|Information on UV exposure dose]] | ||
===Process information=== | ===Process information=== | ||
