Specific Process Knowledge/Lithography/Development/manualEbeam developer: Difference between revisions
Created page with "==Developer: E-beam 02== 400px|right|thumb|Developer: E-beam 02 is located in E-4. Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment. '''[https://www.youtube.com/watch?v=btinNzYnLnY Tra..." |
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=Developer: E-beam 02= | |||
[[Image:IMG 2464.JPG|400px|right|thumb|Developer: E-beam 02 is located in E-4.]] | [[Image:IMG 2464.JPG|400px|right|thumb|Developer: E-beam 02 is located in E-4.]] | ||
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The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login''' | The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login''' | ||
=Process information= | |||
All recipes use the following structure: | All recipes use the following structure: | ||
#Pressurize the developer canister | #Pressurize the developer canister | ||
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*21 A 5x60 | *21 A 5x60 | ||
=Equipment performance and process related parameters= | |||
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Revision as of 12:02, 12 January 2026
Developer: E-beam 02
Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment.
Training video (for Developer: TMAH Manual, but it is the same model)
The user manual, user APV, and contact information can be found in LabManager - requires login
Process information
All recipes use the following structure:
- Pressurize the developer canister
- Dispense puddle while rotating substrate slowly
- Puddle development while not rotating
- Agitate substrate once per 15 seconds by rotating slowly for 1 second
- Spin off developer
- Clean substrate with IPA
- Dry substrate and chamber with nitrogen
Multi-puddle recipes repeat steps 2-5 for the given number of puddles.
Process recipes
N50 recipes have the letter "N" in them. AR-600-50 recipes have the letter "A" in them. The number is the development time in seconds:
- 01 Rinse
- 02 N 15
- 03 N 30
- 04 N 60
- 05 N 90
- 06 N 120
- 07 N 180
- 08 N 300
- 09 N 600
- 10 N 2x60
- 11 N 5x60
- 12 A 15
- 13 A 30
- 14 A 60
- 15 A 90
- 16 A 120
- 17 A 180
- 18 A 300
- 19 A 600
- 20 A 2x60
- 21 A 5x60
| Purpose |
Development of:
| |
|---|---|---|
| Developer |
| |
| Method | Development |
Puddle |
| Handling |
| |
| Process parameters | Temperature |
Room temperature |
| Agitation |
1 second rotational agitation at 30 rpm every 15 seconds | |
| Rinse |
IPA | |
| Substrates | Substrate size |
|
| Allowed materials |
| |
| Batch size |
1 |