Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,498 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,498 edits
Line 427: Line 427:
(4 alignment marks)
(4 alignment marks)
|'''X'''
|'''X'''
|rowspan="2" align="center"|1: 0; 0<br>2: -37500; 0<br>3: 37500; 0<br>4: 0; 35000<br>5: 0; -35000
|rowspan="2" align="center"|1: -37500; 0<br>2: 37500; 0<br>3: 0; 35000<br>4: 0; -35000
|rowspan="2" align="center"|-16.298
|rowspan="2" align="center"|-16.298
| 0.999978
| 0.999978
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_01_processing"