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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 228: Line 228:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|description
|rowspan="2"|2 alignment marks
(comment)
(on Y-axis)
|'''X'''
|'''X'''
|rowspan="2" align="center"|positions
|rowspan="2" align="center"|1: 0; 35000<br>2: 0; -35000
|rowspan="2" align="center"|rotation
|rowspan="2" align="center"|0.000
| x scaling
| -
|rowspan="2" align="center"|shearing
|rowspan="2" align="center"| -
| x error
| 0,11
| x deviation
| ±0,275


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| y scaling
| -
| y error
| -2,69
| y deviation
| ±0,2
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|Field alignment
(after development,<br>global alignment to 2 marks on X-axis)
|'''X'''
|rowspan="2" align="center"|1: -37500; 0<br>2: 37500; 0
|rowspan="2" align="center"|8.414
| -
|rowspan="2" align="center"| -
| 0,04
| ±0,05
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -
| -0,22
| ±0,075
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|2 alignment marks
(top half of wafer)
|'''X'''
|rowspan="2" align="center"|1: -30000; 30000<br>2: 30000; 30000
|rowspan="2" align="center"|-0.003
| -
|rowspan="2" align="center"| -
| 0,08
| ±0,1
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -
| -2,16
| ±0,15
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|2 alignment marks
(bottom half of wafer)
|'''X'''
|rowspan="2" align="center"|1: -30000; -30000<br>2: 30000; -30000
|rowspan="2" align="center"|0.005
| -
|rowspan="2" align="center"| -
| -0,26
| ±0,25
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -
| -0,01
| ±0,15
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|2 alignment marks
(on Y-axis, starting at bottom)
|'''X'''
|rowspan="2" align="center"|1: 0; -35000<br>2: 0; 35000
|rowspan="2" align="center"|0.004
| -
|rowspan="2" align="center"| -
| 0,02
| ±0,1
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| -
| 0,02
| ±0,2


|}
|}
Line 253: Line 329:
|-
|-
|-style="background:silver; color:black"
|-style="background:silver; color:black"
!colspan="2"|MLA1-MLA1
!colspan="2"|MLA3-MLA1
!Mark positions
!Mark positions
!Rotation [mRad]
!Rotation [mRad]
Line 264: Line 340:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|description
|rowspan="2"|4 alignment marks
(comment)
(old QC wafer)
|'''X'''
|rowspan="2" align="center"|1: -35000; -25000<br>2: 35000; -25000<br>3: -35000; 25000<br>4: 35000; 25000
|rowspan="2" align="center"|7.687
| 1.000040
|rowspan="2" align="center"|-0.108
| -0,03
| ±0,625
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Y'''
| 0.999979
| -1.06
| ±1,375
 
|-
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|2 alignment marks
(old QC wafer)
|'''X'''
|'''X'''
|rowspan="2" align="center"|positions
|rowspan="2" align="center"|1: -30000; 0<br>2: 30000; 0
|rowspan="2" align="center"|rotation
|rowspan="2" align="center"|7.951
| x scaling
| -
|rowspan="2" align="center"|shearing
|rowspan="2" align="center"| -
| x error
| -0.94
| x deviation
| ±7,375


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| y scaling
| -
| y error
| -0,72
| y deviation
| ±0.5


|}
|}
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