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| * New formulation will be available in cleanroom and tested: 3005 instead of 2005, 3035 instead of 2035, XTF75 instead of 2075 and new 3025. | | * New formulation will be available in cleanroom and tested: 3005 instead of 2005, 3035 instead of 2035, XTF75 instead of 2075 and new 3025. |
| | TI spray resist is an image reversal resist, similar to AZ 5214E. The process flow will be similar to the process flows for 5214, except for the coating step. The exposure dose and development will depend on the specific process. | | | TI spray resist is an image reversal resist, similar to AZ 5214E. The process flow will be similar to the process flows for 5214, except for the coating step. The exposure dose and development will depend on the specific process. |
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| ! scope=row| Process flow examples
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| Mask aligner:<br>
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| [[media:process_flow_AZ_5214E_positive_MA6_-_2023-02.docx |Process flow AZ 5214E positive MA6]]<br>
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| [[media:process_flow_AZ_5214E_IR_MA6_-_2023-02.docx |Process flow AZ 5214E image reversal MA6]]
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| Maskless aligner:<br>
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| [[media:process_flow_AZ_5214E_positive_MLA_-_2023-02.docx |Process flow AZ 5214E positive MLA]]<br>
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| [[media:process_flow_AZ_5214E_IR_MLA_-_2023-02.docx |Process flow AZ 5214E image reversal MLA]]
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| Mask aligner:<br>
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| [[media:process_flow_AZ_MiR_701_MA6_-_2023-02.docx|Process flow AZ MiR 701 MA6]]
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| Maskless aligner:<br>
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| [[media:process_flow_AZ_MiR_701_MLA_-_2023-02.docx|Process flow AZ MiR 701 MLA]]
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| Mask aligner:<br>
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| [[media:process_flow_AZ_nLOF_2020_MA6_-_2023-02.docx|Process flow AZ nLOF 2020 MA6]]
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| Maskless aligner:<br>
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| [[media:process_flow_AZ_nLOF_2020_MLA_-_2023-02.docx|Process flow AZ nLOF 2020 MLA]]
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| Mask aligner:<br>
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| [[media:process_flow_AZ_4562_MA6_-_2023-02.docx|Process flow AZ 4562 MA6]]
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| Maskless aligner:<br>
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| [[media:process_flow_AZ_4562_MLA_-_2023-02.docx|Process flow AZ 4562 MLA]]
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| Mask aligner:<br>
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| [[media:process_flow_SU-8_MA6_-_2023-02.docx|Process flow SU-8 MA6]]
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| Maskless aligner:<br>
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| [[media:process_flow_SU-8_MLA_-_2023-02.docx|Process flow SU-8 MLA]]
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| NB! Most of the process knowledge about SU-8 is based in research groups
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| |} | | |} |
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| '''Other process flows:'''
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| [[Media:process_flow_chip_on_carrier_-_2023-02.docx|Chip on carrier]]: A procedure for UV lithography on a chip using automatic coater and developer.
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